Reflection Characteristics Analysis of DBR in 940 nm VCSEL

Zhipeng Pan; Wei Li; Lü Jiagang; Jinyuan Chang; Zhennuo Wang; Suping Liu; Li Zhong; Xiaoyu Ma

doi:10.3788/CJL221034

Journals >Chinese Journal of Lasers >Volume 50 >Issue 7 >Page 0701007 > Article

Chinese Journal of Lasers
Vol. 50, Issue 7, 0701007 (2023)

Reflection Characteristics Analysis of DBR in 940 nm VCSEL

Zhipeng Pan^1、2, Wei Li^1、*, Lü Jiagang^1、2, Jinyuan Chang^1、2, Zhennuo Wang^1、2, Suping Liu¹, Li Zhong¹, and Xiaoyu Ma^1、2

Author Affiliations

¹National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²College of Materials Science and Optoelectronic Technology, University of Chinese Academy of Sciences,Beijing 100049, China

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DOI: 10.3788/CJL221034 Cite this Article Set citation alerts

Zhipeng Pan, Wei Li, Lü Jiagang, Jinyuan Chang, Zhennuo Wang, Suping Liu, Li Zhong, Xiaoyu Ma. Reflection Characteristics Analysis of DBR in 940 nm VCSEL[J]. Chinese Journal of Lasers, 2023, 50(7): 0701007 Copy Citation Text

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