• Chinese Physics B
  • Vol. 29, Issue 10, (2020)
Xiu Yang1, Tao Wei2, Feiliang Chen3, Fuhua Gao1、4, Jinglei Du1、4、†, and Yidong Hou1
Author Affiliations
  • 1College of Physics, Sichuan University, Chengdu 60065, China
  • 2School of Medical Information Engineering, Jining Medical University, Jining 7067, China
  • 3Microsystem & Terahertz Research Center of CAEP, China Academy of Engineering Physics, Chengdu 610299, China
  • 4High Energy Density Physics of the Ministry of Education Key Laboratory, Sichuan University, Chengdu 61006, China
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    DOI: 10.1088/1674-1056/ab9def Cite this Article
    Xiu Yang, Tao Wei, Feiliang Chen, Fuhua Gao, Jinglei Du, Yidong Hou. Enhanced reflection chiroptical effect of planar anisotropic chiral metamaterials placed on the interface of two media[J]. Chinese Physics B, 2020, 29(10): Copy Citation Text show less
    Simulated reflection intensities of the Z-PCMI and Z-PCMS. (a) Schematic diagram of the Z-PCMI. The structure parameters are set as w1 = 115 nm, w2 = 85 nm, L1 = 125 nm, L2 = 105 nm, Px = 235 nm, and Py = 335 nm. The thickness h of the Z-shaped PACMs is 40 nm. (b) Schematic diagram of the Z-PCMS. (c)–(f) The simulated reflection intensities and CDR of the Z-PCMI and Z-PCMS, respectively.
    Fig. 1. Simulated reflection intensities of the Z-PCMI and Z-PCMS. (a) Schematic diagram of the Z-PCMI. The structure parameters are set as w1 = 115 nm, w2 = 85 nm, L1 = 125 nm, L2 = 105 nm, Px = 235 nm, and Py = 335 nm. The thickness h of the Z-shaped PACMs is 40 nm. (b) Schematic diagram of the Z-PCMS. (c)–(f) The simulated reflection intensities and CDR of the Z-PCMI and Z-PCMS, respectively.
    The distribution of the electric field of the (a), (b) Z-PCMI and (c), (d) Z-PCMS at the resonant wavelengths of 1582 nm and 578 nm under the illumination of LCP and RCP.
    Fig. 2. The distribution of the electric field of the (a), (b) Z-PCMI and (c), (d) Z-PCMS at the resonant wavelengths of 1582 nm and 578 nm under the illumination of LCP and RCP.
    The charge distribution of the (a), (b) Z-PCMI and (c), (d) Z-PCMS at the resonant wavelengths of 1582 nm and 578 nm under the illumination of the LCP and RCP.
    Fig. 3. The charge distribution of the (a), (b) Z-PCMI and (c), (d) Z-PCMS at the resonant wavelengths of 1582 nm and 578 nm under the illumination of the LCP and RCP.
    The influence of the refractive index ntop on CD peaks. (a), (b) The reflection CDR and transmission CDT intensities of the Z-PCMI for the light illuminating along –Z direction. (c), (d) The reflection CDR and transmission CDT intensities of the Z-PCMI for the light illuminating along +Z direction.
    Fig. 4. The influence of the refractive index ntop on CD peaks. (a), (b) The reflection CDR and transmission CDT intensities of the Z-PCMI for the light illuminating along –Z direction. (c), (d) The reflection CDR and transmission CDT intensities of the Z-PCMI for the light illuminating along +Z direction.
    (a), (c), (e) The reflection intensities and (b), (d), (f) transmission intensities of the Z-PCMI. The reflection and transmission intensities are obtained for the light illuminating along –Z direction.
    Fig. 5. (a), (c), (e) The reflection intensities and (b), (d), (f) transmission intensities of the Z-PCMI. The reflection and transmission intensities are obtained for the light illuminating along –Z direction.
    The dispersion relation of the off-diagonal elements (rxy and ryx) of the linear reflection coefficients. (a)–(c) The linear polarization light illuminates the Z-PCMI along –Z direction. (d)–(f) The linear polarization light illuminates the Z-PCMI along +Z direction.
    Fig. 6. The dispersion relation of the off-diagonal elements (rxy and ryx) of the linear reflection coefficients. (a)–(c) The linear polarization light illuminates the Z-PCMI along –Z direction. (d)–(f) The linear polarization light illuminates the Z-PCMI along +Z direction.
    The reflection intensities of the G-PCMI and 卍-PCMI. (a) Schematic diagram of the G-PCMI, the structure parameters are set as W3 = 115 nm, L3 = 335 nm, Px = 235 nm, and Py = 335 nm. (b) Schematic diagram of the 卍-PCMI, the structure parameters are set as W4 = 50 nm, L4 = 250 nm, L5 = 125 nm, and Px = Py = 450 nm. The thickness h for both of the Ag-metal-grating and the 卍-shaped structures is 40 nm. The reflection intensities of (c), (e), (g) the G-PCMI; and (d), (f) (h) the 卍-PCMI. The refractive index ntop is increased from 1 to 4, while the refractive index nbottom keeps at 1.49.
    Fig. 7. The reflection intensities of the G-PCMI and 卍-PCMI. (a) Schematic diagram of the G-PCMI, the structure parameters are set as W3 = 115 nm, L3 = 335 nm, Px = 235 nm, and Py = 335 nm. (b) Schematic diagram of the 卍-PCMI, the structure parameters are set as W4 = 50 nm, L4 = 250 nm, L5 = 125 nm, and Px = Py = 450 nm. The thickness h for both of the Ag-metal-grating and the 卍-shaped structures is 40 nm. The reflection intensities of (c), (e), (g) the G-PCMI; and (d), (f) (h) the 卍-PCMI. The refractive index ntop is increased from 1 to 4, while the refractive index nbottom keeps at 1.49.
    Xiu Yang, Tao Wei, Feiliang Chen, Fuhua Gao, Jinglei Du, Yidong Hou. Enhanced reflection chiroptical effect of planar anisotropic chiral metamaterials placed on the interface of two media[J]. Chinese Physics B, 2020, 29(10):
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