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Journals >Acta Physica Sinica >Volume 69 >Issue 7 >Page 076801-1 > Article

Acta Physica Sinica
Vol. 69, Issue 7, 076801-1 (2020)

Atomic simulation of Si_yH_x structure configuration in a-Si:H thin films

Shi-Ming Zhai, Huang-Sheng Liao, Nai-Gen Zhou^*, Hai-Bin Huang^*, and Lang Zhou

Author Affiliations

School of Materials Science and Engineering, Institute of Photovoltaics, Nanchang University, Nanchang 330031, China

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DOI: 10.7498/aps.69.20191275 Cite this Article

Shi-Ming Zhai, Huang-Sheng Liao, Nai-Gen Zhou, Hai-Bin Huang, Lang Zhou. Atomic simulation of Si_yH_x structure configuration in a-Si:H thin films [J]. Acta Physica Sinica, 2020, 69(7): 076801-1 Copy Citation Text

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References

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Shi-Ming Zhai, Huang-Sheng Liao, Nai-Gen Zhou, Hai-Bin Huang, Lang Zhou. Atomic simulation of Si_yH_x structure configuration in a-Si:H thin films [J]. Acta Physica Sinica, 2020, 69(7): 076801-1

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