• Chinese Optics Letters
  • Vol. 4, Issue 10, 611 (2006)
[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092
  • 2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611 Copy Citation Text show less
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    CLP Journals

    [1] Junling Qin, Jianda Shao, Kui Yi, Zhengxiu Fan. Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number[J]. Chinese Optics Letters, 2007, 5(5): 301

    [2] Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, Jingtao Zhu. Mo/Si aperiodic multilayer broadband reflective mirror for 12.5–28.5-nm wavelength range[J]. Chinese Optics Letters, 2011, 9(2): 023102

    [3] Liqin Liu, Zhanshan Wang, Jingtao Zhu, Zhong Zhang, Moyan Tan, Qiushi Huang, Rui Chen, Jing Xu, Lingyan Chen. Intrinsic stress analysis of sputtered carbon film[J]. Chinese Optics Letters, 2008, 6(5): 384

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611
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