B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Optics Letters >Volume 4 >Issue 10 >Page 611 > Article

Chinese Optics Letters
Vol. 4, Issue 10, 611 (2006)

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]²

Author Affiliations

¹Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092

²National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611 Copy Citation Text

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Abstract

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.

Keywords

310.1830 340.6720 340.7470 230.4170

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