• Chinese Journal of Lasers
  • Vol. 28, Issue 10, 941 (2001)
[in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Modification in the Optical Properties of VO2 Thin Films by Low Fluence Electron Irradiation[J]. Chinese Journal of Lasers, 2001, 28(10): 941 Copy Citation Text show less

    Abstract

    VO2 thin films prepared by vacuum annealing process were irradiated by 10 12 /cm 2 low fluence electron beam with energy of 0.8 MeV. Before and after irradiation the samples were characterized by XRD, UV VIS and Raman spectroscopy analyses. After electron irradiation the optical response to temperature was increased dramatically, the hysteresis extend was reduced, and the phase transition point was not changed obviously. And the transmittance of 370~900 nm was increased and absorptivity was decreased. The abnormal change of optical properties at metallic boundary was introduced by low fluence electron. Obvious change of XRD patterns and vibration peak were observed in samples before and after irradiation by low fluence electron.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Modification in the Optical Properties of VO2 Thin Films by Low Fluence Electron Irradiation[J]. Chinese Journal of Lasers, 2001, 28(10): 941
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