• Semiconductor Optoelectronics
  • Vol. 41, Issue 4, 517 (2020)
SU Dan1、2、3, ZHAO Jiangshan1、2、3、*, and WANG Qian1、2、3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2020.04.013 Cite this Article
    SU Dan, ZHAO Jiangshan, WANG Qian. Effects of Preionization on Properties of ArF Excimer Laser[J]. Semiconductor Optoelectronics, 2020, 41(4): 517 Copy Citation Text show less

    Abstract

    A fluid model is used to investigate the discharge kinetics of ArF excimer laser. By comparing the gas discharge at different initial preionization intensities, the effects of preionization on discharge excited excimer laser system are analyzed. The preionization effect under different gas parameters is also discussed. The results show that the initial preionization intensity has significant effects on the breakdown voltage, the formation of ArF excimer, the optical quality and gain. Under the premise of uniform electric field and effective discharge, it is difficult to reach the gas breakdown threshold with low initial preionization intensity, but higher laser power can be obtained. Increasing the initial preionization intensity can effectively reduce the breakdown voltage, but it’s not conducive to the absorption and conversion of energy. The preionization capability is affected by the gas pressure and fluorine ratio. The increasing of gas pressure or fluorine concentration can reduce the effectiveness of preionization.
    SU Dan, ZHAO Jiangshan, WANG Qian. Effects of Preionization on Properties of ArF Excimer Laser[J]. Semiconductor Optoelectronics, 2020, 41(4): 517
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