[1] K. Kitayama, X.Wang, and N.Wada, J. Lightwave Technol. 24, 1654 (2006).

[2] X. Wang, N. Kataoka, N. Wada, G. Cincotti, and K. Kitayama, in Proceedings of OFC 2008 OMR2 (2008).

[3] P. C. Teh, P. Petropoulos, M. Ibsen, and D. J. Richardson, J. Lightwave Technol. 19, 1352 (2001).

[4] K. Sasaki, N. Minato, T. Ushikubo, and Y. Arimoto, in Proceedings of OFC 2008 OMR8 (2008).

[5] V. J. Hernandez, Y. Du, W. Cong, R. P. Scott, K. Li, J. P. Heritage, Z. Ding, B. H. Kolner, and S. J. B. Yoo, J. Lightwave Technol. 22, 2671 (2004).

[6] T. H. Shake, J. Lightwave Technol. 23, 1652 (2005).

[7] A. Agarwal, R. Menendez, P. Toliver, T. Banwell, J. Jackel, and S. Etemad, Opt. Express 16, 1399 (2008).

[8] W.-H. Yang and C.-S. Wu, in Proceedings of ICON 2006 350 (2006).

[9] K. Kieu and M. Mansuripur, Opt. Lett. 33, 64 (2008).

[10] J. Wang, H. Zhang, J. Zhang, M. Yan, and M. Yao, Chinese J. Lasers (in Chinese) 34, 163 (2007).

[11] F. Lu, Y. Deng, and W. H. Knox, Opt. Lett. 30, 1566 (2005).

[12] H. Zhou, C. Lou, S. Pan, and Y. Yang, J. Tsinghua Univ. (Sci. Tech.) (in Chinese) 48, 538 (2008).

[13] H. Wang, M. Yao, H. Zhang, and B. Zhou, Chinese J. Lasers (in Chinese) 34, 1502 (2007).

[14] Z. Zhang, H. Zhang, X. Fu, and M. Yao, Chinese J. Lasers (in Chinese) 35, 378 (2008).