Wei SUN, Shangzhong JIN, Yin ZHANG, Zijuan SUN, Sheng XU. Design and Experiment of Multi-parameter Thin-film Measurement System[J]. Optoelectronic Technology, 2024, 44(3): 248
- Optoelectronic Technology
- Vol. 44, Issue 3, 248 (2024)
Fig. 1. RA-FA ellipsometry measurement structure
Fig. 2. Diagram of experiment device
Fig. 3. Silicon dioxide thickness and thickness distribution measurement verification, in which (a) (b) (c) (d) are the measurement results of the thickness and thickness distribution of sample 1; (e) (f) (g) (h) are the measurement results of the thickness and thickness distribution of sample 2; (i) (j) (k) (l) are the measurement results of the thickness and thickness distribution of sample 3.
Fig. 4. Tantalum pentoxide thickness and thickness distribution measurement verification, in which (a) (b) (c) (d) are the measurement results of thickness and thickness distribution of sample 4; (e) (f) (g) (h) are the measurement results of thickness and thickness distribution of sample 5; (i) (j) (k) (l) are the measurement results of thickness and thickness distribution of sample 6.
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Table 1. Measurement results of film curvature and residual stress
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