[1] BARLETTA W A, BISOGNANO J, CORLETT J N, et al. Free electron lasers: present status and future challenges[J]. Nuclear Instruments and Methods in Physics Research Section A, 2010, 618(1-3): 69-96.
[2] BENCIVENGA F, CAPOTONDI F, PRINCIPI E, et al. Coherent and transient states studied with extreme ultraviolet and X-ray free electron lasers: present and future prospects[J]. Advances in Physics, 2014, 63(5-6): 327-404.
[3] STORMER M, LIARD-CLOUP A, FELTEN F, et al. Investigations of large x ray optics for free electron lasers[C]. SPIE, 2004, 5533: 58-65.
[4] WIESMANN J, MICHAELSEN C, HERTLEIN F, et al. State-of-the-art thin film x-ray optics for synchrotrons and FEL sources[C]. SPIE, 2007, 6586: 774-777.
[5] SOUFLI R, PIVOVAROFF M J, BAKER S L, et al. Development, characterization and experimental performance of x-ray optics for the LCLS free-electron laser[C]. SPIE, 2008, 7077: 707716.
[6] SOUFLI R, BAKER S L, ROBINSON J C, et al. Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors[C]. SPIE, 2009, 7361: 73610U.
[7] STEEG B, JUHA L, FELDHAUS J, et al. Total reflection amorphous carbon mirrors for vacuum ultraviolet free electron lasers[J]. Applied Physics Letters, 2004, 84(5): 657-659.
[8] JHUA L, BITTNER M, GRAZIA M D, et al. Radiation damage to amorphous-carbon optical coatings[C]. SPIE, 2005, 5917: 59170F.
[9] NUSKE R, JURGILAITIS A, ENQUIST H, et al. Picosecond time-resolved x-ray refectivity of a laser-heated amorphous carbon film[J]. Applied Physics Letters, 2011, 98(10): 101909.
[10] CHALUPSKY J, HAJKOVA V, ALTAPOVA V, et al. Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle[J]. Applied Physics Letters, 2009, 95(3): 031111.
[11] FARAHANI S D, CHALUPSKY J, BURIAN T, et al. Damage threshold of amorphous carbon mirror for 177eV FEL radiation[J]. Nuclear Instruments and Methods in Physics Research Section A, 2011, 635(1): S39-S42.
[12] JACOBI S, WIESMANN J, STEEG B, et al. Development of thin-film total-reflection mirrors for the XUV FEL[C]. SPIE, 2001, 4500: 187-192.
[13] JACOBI S, STEEG B, WIESMANN J, et al. Characterization of amorphous carbon films as total-reflection mirrors for XUV free electron lasers[C]. SPIE, 2002, 4782: 113-121.
[14] CORAGGIA S, FRASSETTO F, AZNAREZ J A, et al. Carbon coatings for extreme-ultraviolet high-order laser harmonics[J]. Nuclear Instruments and Methods in Physics Research Section A, 2011, 635(1): S43-S46.
[15] WEDOWSKI M, UNDERWOOD J H, GULLIKSON E M, et al. High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography[C]. SPIE, 2000, 3997: 83-93.
[16] GULLIKSON E M, MROWKA S, KAUFMANN B B. Recent developments in euv reflectometry at the advanced light source[C]. SPIE, 2000, 4343: 363-373.
[17] ZHAO Z T, WANG D, CHEN J H, et al. First lasing of an echo-enabled harmonic generation free-electron laser[J]. Nature Photonics, 2012, 6(6): 360-363.
[18] LIU L Q, WANG Z S, ZHU J T, et al. Intrinsic stress analysis of sputtered carbon film[J]. Chinese Optics Letters, 2008, 6(5): 384-385.
[19] YANG Xin-yan, WANG Xin, YI Sheng-zhen, et al. Pt and Pt/Cr release layer used in hot slumping glass technology[J]. Acta Photonica Ssinica, 2015, 44(6): 631001.
[21] The Center for X-Ray Optics [DB/OL]. [2014-11-29]. http://www.cxro.lbl.gov/
[22] ZHANG Jing, FU Xiu-hua, YANG Fei, et al. Growth process parameters of BaTiO3 crystal thin film in PLD method[J]. Acta Photonica Sinica, 2014, 43(5): 531002.