• Chinese Journal of Lasers
  • Vol. 36, Issue s2, 30 (2009)
Hu Fangrong1、2、*, Yao Jun1, and Chen Jianming3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/cjl200936s2.0030 Cite this Article Set citation alerts
    Hu Fangrong, Yao Jun, Chen Jianming. Effects of Residual Stress on the Performances of Electrostatically Actuated MEMS Micromirrors[J]. Chinese Journal of Lasers, 2009, 36(s2): 30 Copy Citation Text show less

    Abstract

    Residual stress is an inevitable factor in microelectromechanical system (MEMS) surface micromachining,it affects the performances of the devices. In this paper,the formulas for calculating the pull-in voltage and the stroke of an electrostatic micromirror with residual stress existed have been derived by introducing an equivalent mechanical model,and the effect of the residual stress on the eigen-frequency of the micromirror is analyzed. The result shows that the eigen-frequency increases with the residual stress. The micromirror surface profile,under different residual stress,is tested by a white light interferometer. Experimental results indicate that the residual stress makes a warp on the surface,and it declines Strehl ratio and lower the image quality.
    Hu Fangrong, Yao Jun, Chen Jianming. Effects of Residual Stress on the Performances of Electrostatically Actuated MEMS Micromirrors[J]. Chinese Journal of Lasers, 2009, 36(s2): 30
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