• Opto-Electronic Engineering
  • Vol. 35, Issue 12, 45 (2008)
XU Jun-qi1、2、*, FAN Hui-qing1, LIU Wei-guo2, and SU Jun-hong2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    XU Jun-qi, FAN Hui-qing, LIU Wei-guo, SU Jun-hong. Laser Damage Properties and Process Optimization of Diamond-like Carbon Thin Films[J]. Opto-Electronic Engineering, 2008, 35(12): 45 Copy Citation Text show less

    Abstract

    The Diamond-like Carbon(DLC) films were prepared by Pulse Vacuum Arc Deposition(PVAD) technique,the Laser-induced Damage Threshold(LIDT) of these films was investigated,and the preparation process was optimized.The results indicate that with the increase of the film thickness,the LIDT decreases firstly and then become stable above 100 nm.The study and analysis to orthogonal experiment results reveal that compared with other experiment parameters such as substrate temperature,cleaning time and pulse frequency in the experiment range,the main voltage is the most important factor to affect the laser-induced damage resistance of DLC films.An optimization process was obtained in the study at the cleaning time of 20 min,substrate temperature of 150 ℃,pulse frequency of 5 Hz and main voltage of 150 V.The LIDT of the DLC films can be improved by annealing in some degree.
    XU Jun-qi, FAN Hui-qing, LIU Wei-guo, SU Jun-hong. Laser Damage Properties and Process Optimization of Diamond-like Carbon Thin Films[J]. Opto-Electronic Engineering, 2008, 35(12): 45
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