• Chinese Journal of Lasers
  • Vol. 26, Issue 3, 257 (1999)
[in Chinese]1、2, [in Chinese]1、2, [in Chinese]1、2, [in Chinese]1、2, [in Chinese]1、2, [in Chinese]1、2, and [in Chinese]1、2
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Minimum Excited Threshold in Electron Trapping Materials[J]. Chinese Journal of Lasers, 1999, 26(3): 257 Copy Citation Text show less

    Abstract

    By means of projecting a reference light and measuring the light on the photocathode of a streak camera, the minimum excited threshold in electron trapping materials can be measured. The infrared minimum excited threshold of CaS∶Eu, Sm is measured to be less than 4.8×10 -9 J/mm 2 by a visible streak camera. The minimum detectable energy density of the camera is less than 8.3×10 -10 J/mm 2 (532 nm). The phosphor investigated is efficiently stimulated with the 1.064 μm photons from a pulsed CPM Nd∶YAG laser. According to the result, it is shown that this kind of novel materials might be used in the ETM based infrared photocathodes and other fields.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Minimum Excited Threshold in Electron Trapping Materials[J]. Chinese Journal of Lasers, 1999, 26(3): 257
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