• High Power Laser and Particle Beams
  • Vol. 35, Issue 8, 085001 (2023)
Baoqing Zhang
Author Affiliations
  • Key Laboratory of Pulsed Power, Institute of Fluid Physics, CAEP, P.O. Box 919-108, Mianyang 621900, China
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    DOI: 10.11884/HPLPB202335.230034 Cite this Article
    Baoqing Zhang. Development of 100 kV/25 mA high voltage DC power supply with lower ripple[J]. High Power Laser and Particle Beams, 2023, 35(8): 085001 Copy Citation Text show less

    Abstract

    High voltage DC power supply is widely used in research and application areas of electron beam. Recently the method of decreasing ripple is a research hotspot due to the ripple of high voltage is the very key factor to quality of beams. This paper studies a novel circuit topology, which is comprised of a high bridge converter and a double polarity Cockcroft-Walton circuit with unsymmetrical capacitors. The experimental results show that the ripple is lower than 0.06% when the output voltage and current are 100 kV and 25 mA, respectively. Meanwhile the storage energy of high voltage units is only 0.85 of traditional circuit.
    $ \Delta V = \dfrac{{n{I_{\text{e}}}}}{{4f{C_{2n}}}} $(1)

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    $ \dfrac{{{C_{2n}}}}{{2 \times 9}}({({V_0} + \Delta V)^2} - {({V_0} - \Delta V)^2}) = {V_0}{I_{\text{e}}}\Delta t $(2)

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    $ \Delta t = \dfrac{1}{{2f}} $(3)

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    $ \Delta V = 0.5{V_0}\eta $(4)

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    $ {\eta _{\text{v}}} = \dfrac{{{V_0}}}{{2N{V_{\text{p}}}}} $(5)

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    Baoqing Zhang. Development of 100 kV/25 mA high voltage DC power supply with lower ripple[J]. High Power Laser and Particle Beams, 2023, 35(8): 085001
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