Fig. 1. Cubooctahedral cluster in Cu matrix.基体Cu中立方八面体团簇

Fig. 2. Three configurations of δ-Ni₂Si cluster δ-Ni₂Si团簇的三种构型

Fig. 3. Radial atomic density around 3 different sites Ni¹, Ni² and Si¹ in the δ-Ni₂Si phase. δ-Ni₂Si相中分别以Ni¹, Ni², Si¹为心部原子的团簇径向原子密度

Fig. 4. Thirteen configurations of γ-Ni₅Si₂ cluster γ-Ni₅Si₂团簇的十三种构型

Fig. 5. Radial atomic density around 13 different sites Ni¹, Ni², Si¹, Ni³, Ni⁴, Si², Si³, Si⁴, Si⁵, Ni⁵, Ni⁶, Ni⁷, Ni⁸ and Ni⁸ in the γ-Ni₅Si₂ phase. γ-Ni₅Si₂晶体相中分别以Ni¹, Ni², Si¹, Ni³, Ni⁴, Si², Si³, Si⁴, Si⁵, Ni⁵, Ni⁶, Ni⁷, Ni⁸为心的团簇径向原子分布

Fig. 6. Two configurations of β-Ni₃Si cluster β-Ni₃Si团簇的两种构型

Fig. 7. XRD patterns of the alloys when C_Cu is 93.75%, 95%, 95.83%, 96.7% and 97.5%, and the Ni/Si (at.%) is (a) 2, (b) 2.5 and (c) 3 in each composition point, respectively. Ni/Si(at.%)分别为 (a) 2, (b) 2.5和(c) 3在C_Cu分别为 93.75%, 95%, 95.83%, 96.7%和97.5% 每一成分点处的合金XRD谱图

Fig. 8. The microstructure of the alloys. The Ni/Si is (a) 2, (b) 2.5 and (c) 3 when C_Cu is 93.75% and Ni/Si is (a) 2, (b) 2.5 and (c) 3 when C_Cu is 96.7%, respectively. 合金的微观形貌. C_Cu为 93.75% 时Ni/Si 分别为(a) 2, (b) 2.5和(c) 3及C_Cu为96.7% 时Ni/Si 分别为(d) 2, (e) 2.5或(f) 3

Fig. 9. (a) Bright-field micrographs and (b) selected area diffraction patterns of the Cu_96.7Ni_2.36Si_0.94 sample. Cu_96.7Ni_2.36Si_0.94 样品的(a)明场像和(b)选区衍射图***图(b)(123)中，2上面也有横杠***

Fig. 10. (a) Ni/Si is 2, 2.5 and 3 respectively, the variation of vickers hardness and electrical conductivity as increase C_Cu; the variation of (b) electrical conductivity and (c) vickers hardness as atomic percent of Cu,Ni and Si in ternary phase diagram. (a) Ni/Si分别为2, 2.5, 3时, 维氏硬度和导电性随C_Cu的变化; 三元相图中 (b) 导电性和(c)维氏硬度随Cu, Ni和Si元素的原子分数的变化***图(a)和(b)中均应为%IACS***

Table 4. Ni/Si(at.%), Cluster formula, Composition(at.%), Vickers Hardness (kgf/mm²) and Electrical conductivity(%IACS) of Cu-Ni-Si-M (M = Fe or null) alloys.