Author Affiliations
1Key Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China2Beijing Radiation Center, Beijing 100875, China3Science and Technology on Plasma Dynamics Laboratory, Air Force Engineering University, Xi’an 710038, Chinashow less
Fig. 1. The schematic diagram of the FCVA deposition system.
Fig. 2. Distribution of the layers in the coating.
Fig. 3. Thecrosssection of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2:(a) 0 sccm; (b) 10 sccm; (c) 15 sccm
Fig. 4. XRD diffractogram of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 5. Raman spectra of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 6. XPS analysis of S3: (a) N 1s;(b) C 1s;(c) Ti 2p; (d) Al 2p.
Fig. 7. Potentiodynamic polarization curves of TiAlCN/TiAlN/TiAl coatings in 3.5 wt-% NaCl solution.
Fig. 8. Results of Electrochemical corrosion characterization activities for TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 9. Electrochemical impedance spectroscopy of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 10. Bode plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 11. Bode phase angle plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 12. SEM surface micrographs of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a)0 sccm; (b)10 sccm; (c)15 sccm.
Fig. 13. Friction coefficient curves of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 14. Friction coefficientand wear rate of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 15. SEM micrographs of the wear track and EDS results of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a), (b) 0 sccm; (c), (d) 10 sccm; (e), (f) 15 sccm.
Fig. 16. Raman spectra of wear track of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
| Sample | C2H2/sccm
| Ti/at.% | Al/at.% | N/at.% | C/at.% | TiAlN/TiAl | S1 | 0 | 30.87 | 22.85 | 46.28 | — | TiAlCN/TiAlN/TiAl | S2 | 10 | 28.64 | 21.52 | 41.23 | 8.61 | TiAlCN/TiAlN/TiAl | S3 | 15 | 27.60 | 22.95 | 37.07 | 12.39 |
|
Table 1. Chemical composition of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的元素相对含量
| Sample | C2H2/sccm
| E/GPa
| H/GPa
| H/E | TiAlN/TiAl | S1 | 0 | 290.20 | 30.53 | 0.105 | TiAlCN/TiAlN/TiAl | S2 | 10 | 310.65 | 41.16 | 0.133 | TiAlCN/TiAlN/TiAl | S3 | 15 | 316.14 | 44.36 | 0.140 |
|
Table 2. Microhardness、Modules and ratio of H/E of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的显微硬度、杨氏模量和H/E比值