• Acta Physica Sinica
  • Vol. 69, Issue 10, 107202-1 (2020)
Shu-Nian Chen1, Bin Liao1、*, Lin Chen2, Zhi-Qiang Zhang1, Yong-Qing Shen1, Hao-Qi Wang1, Pan Pang2, Xian-Ying Wu1, Qing-Song Hua1, and Guang-Yu He3
Author Affiliations
  • 1Key Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China
  • 2Beijing Radiation Center, Beijing 100875, China
  • 3Science and Technology on Plasma Dynamics Laboratory, Air Force Engineering University, Xi’an 710038, China
  • show less
    DOI: 10.7498/aps.69.20200012 Cite this Article
    Shu-Nian Chen, Bin Liao, Lin Chen, Zhi-Qiang Zhang, Yong-Qing Shen, Hao-Qi Wang, Pan Pang, Xian-Ying Wu, Qing-Song Hua, Guang-Yu He. Corrosion and tribological properties of TiAlCN/TiAlN/TiAlcomposite system deposited by magneticfliter cathode vacuum arctechnique[J]. Acta Physica Sinica, 2020, 69(10): 107202-1 Copy Citation Text show less
    The schematic diagram of the FCVA deposition system.
    Fig. 1. The schematic diagram of the FCVA deposition system.
    Distribution of the layers in the coating.
    Fig. 2. Distribution of the layers in the coating.
    Thecrosssection of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2:(a) 0 sccm; (b) 10 sccm; (c) 15 sccm
    Fig. 3. Thecrosssection of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2:(a) 0 sccm; (b) 10 sccm; (c) 15 sccm
    XRD diffractogram of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 4. XRD diffractogram of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Raman spectra of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 5. Raman spectra of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    XPS analysis of S3: (a) N 1s;(b) C 1s;(c) Ti 2p; (d) Al 2p.
    Fig. 6. XPS analysis of S3: (a) N 1s;(b) C 1s;(c) Ti 2p; (d) Al 2p.
    Potentiodynamic polarization curves of TiAlCN/TiAlN/TiAl coatings in 3.5 wt-% NaCl solution.
    Fig. 7. Potentiodynamic polarization curves of TiAlCN/TiAlN/TiAl coatings in 3.5 wt-% NaCl solution.
    Results of Electrochemical corrosion characterization activities for TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 8. Results of Electrochemical corrosion characterization activities for TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Electrochemical impedance spectroscopy of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 9. Electrochemical impedance spectroscopy of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Bode plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 10. Bode plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Bode phase angle plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 11. Bode phase angle plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    SEM surface micrographs of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a)0 sccm; (b)10 sccm; (c)15 sccm.
    Fig. 12. SEM surface micrographs of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a)0 sccm; (b)10 sccm; (c)15 sccm.
    Friction coefficient curves of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 13. Friction coefficient curves of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Friction coefficientand wear rate of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 14. Friction coefficientand wear rate of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    SEM micrographs of the wear track and EDS results of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a), (b) 0 sccm; (c), (d) 10 sccm; (e), (f) 15 sccm.
    Fig. 15. SEM micrographs of the wear track and EDS results of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a), (b) 0 sccm; (c), (d) 10 sccm; (e), (f) 15 sccm.
    Raman spectra of wear track of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    Fig. 16. Raman spectra of wear track of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
    SampleC2H2/sccm Ti/at.%Al/at.%N/at.%C/at.%
    TiAlN/TiAlS1030.8722.8546.28
    TiAlCN/TiAlN/TiAlS21028.6421.5241.238.61
    TiAlCN/TiAlN/TiAlS31527.6022.9537.0712.39
    Table 1.

    Chemical composition of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.

    不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的元素相对含量

    SampleC2H2/sccm E/GPa H/GPa H/E
    TiAlN/TiAlS10290.2030.530.105
    TiAlCN/TiAlN/TiAlS210310.6541.160.133
    TiAlCN/TiAlN/TiAlS315316.1444.360.140
    Table 2.

    Microhardness、Modules and ratio of H/E of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.

    不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的显微硬度、杨氏模量和H/E比值

    Shu-Nian Chen, Bin Liao, Lin Chen, Zhi-Qiang Zhang, Yong-Qing Shen, Hao-Qi Wang, Pan Pang, Xian-Ying Wu, Qing-Song Hua, Guang-Yu He. Corrosion and tribological properties of TiAlCN/TiAlN/TiAlcomposite system deposited by magneticfliter cathode vacuum arctechnique[J]. Acta Physica Sinica, 2020, 69(10): 107202-1
    Download Citation