• Optoelectronics Letters
  • Vol. 8, Issue 6, 460 (2012)
Shi-na LI, Rui-xin MA*, Liang-wei HE, Yu-qin XIAO, Jun-gang HOU, and Shu-qiang JIAO
Author Affiliations
  • Department of Non-ferrous Metallurgy, School of Metallurgical and Ecological Engineering, University of Science and Technology Beijing, Beijing 100083, China
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    DOI: 10.1007/s11801-012-2321-7 Cite this Article
    LI Shi-na, MA Rui-xin, HE Liang-wei, XIAO Yu-qin, HOU Jun-gang, JIAO Shu-qiang. Preparation and characteristics of Nb-doped indium tin oxide thin films by RF magnetron sputtering[J]. Optoelectronics Letters, 2012, 8(6): 460 Copy Citation Text show less
    References

    [1] A. E. Delahoy, L. Chen, M. Akhtar, B. Sang and S. Guo, Solar Energy 77, 785 (2004).

    [2] C. P. Li, B. H. Yang, L. R. Qian, S. Xu, W. Dai, M. J. Li, X. W. Li and C. Y. Gao, Optoelectronics Letters 7, 431 (2011).

    [3] R. X. Ma, Optoelectronics Letters 7, 45 (2011).

    [4] R. B. H. Tahar, T. Ban, Y. Ohya and Y. Takahashi, J. Appl. Phys. 81, 321 (1998).

    [5] E. Aperathitis, M. Bender, V. Cimalla, G. Ecke and M. Modreanu, J. Appl. Phys. 94, 1258 (2003).

    [6] Y. F. Lan, W. C. Peng, Y. H. Lo and J. L. He, Materials Research Bulletin 44, 1760 (2009).

    [7] L. J. Meng, J. Gao, M. P. dos Santosd, X. Wang and T. T. Wang, Thin Solid Films 516, 1365 (2008).

    [8] J. P. Zheng and H. S. Kwok, Applied Physics Letters 63, 1 (1993).

    [9] Y. Takahashi, S. Okada, R. B. H. Tahar, K. Nakano, T. Ban and Y. Ohya, Journal of Non-Crystalline Solids 218, 129 (1997).

    [10] T. Sasabayashia, N. Itoa, E. Nishimuraa, M. Kona, P. K. Songa, K. Utsumib, A. Kaijoc and Y. Shigesato, Thin Solid Films 445, 219 (2003).

    [11] A. Luis, C. Nunes de Carvalho, G. Lavareda, A. Amaral, P. Brogueira and M. H. Godinh, Vacuum 64, 475 (2002).

    [12] G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo and E. F. da Silva Jr, Applied Surface Science 255, 755 (2008).

    [13] A. Amaral, P. Brogueira, C. Nunes de Carvalho and G. Lavareda, Journal of Nanoscience and Nanotechnology 10, 2713 (2010).

    [14] M. F. A. M. van Hest, M. S. Dabney, J. D. Perkins and D. S. Ginley, Applied Physics Letters 87, 2111 (2005).

    [15] S. H. Paeng, M. W. Park and Y. M. Sung, Surface and Coatings Technology 205, 210 (2010).

    [16] R. K. Gupta, K. Ghosh, R. Patel and P. K. Kahol, Applied Surface Science 255, 6252 (2009).

    [17] M. Yang, J. H. Feng, G. F. Li and Q. Zhang, Journal of Crystal Growth 310, 3474 (2008).

    [18] Y. M. Kang, S. H. Kwon, J. H. Choi, Y. J. Cho and P. K. Song, Thin Solid Films 518, 3081 (2010).

    [19] S. M. Chung, J. H. Shin, W. S. Cheong, C. S. Hwang, K. I. Choa and Y. J. Kim, Ceramics International 38, s617 (2012).

    [20] C. H. Yang, S. C. Lee, T. C. Lin and W. Y. Zhuang, Materials Science Engineering B 134, 68 (2006).

    [21] J. Yao, J. Shao, H. He and Z. X. Fan, Applied Surface Science 253, 8911 (2007).

    [22] H. Kim, J. S. Horwitz, G. P. Kushto, S. B. Qadri, Z. H. Kafafi and D. B. Chrisey, Appl. Phys. Lett. 78, 1050 (2001).

    [23] A. Sarkara, S. Ghosha, S. Chaudhuria and A. K. Pal, Thin Solid Films 204, 255 (1991).

    LI Shi-na, MA Rui-xin, HE Liang-wei, XIAO Yu-qin, HOU Jun-gang, JIAO Shu-qiang. Preparation and characteristics of Nb-doped indium tin oxide thin films by RF magnetron sputtering[J]. Optoelectronics Letters, 2012, 8(6): 460
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