Study on KrCl and XeCl double laser oscillation

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 12 >Issue 9 >Page 521 > Article

Chinese Journal of Lasers
Vol. 12, Issue 9, 521 (1985)

Study on KrCl and XeCl double laser oscillation

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on KrCl and XeCl double laser oscillation[J]. Chinese Journal of Lasers, 1985, 12(9): 521 Copy Citation Text

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Abstract

A double wavelength laser which oscillates at 308 nm(XeCl) and 222 nm (KrCl) has been achieved from a mixture of Kr/Xe/HCl/He. KrCl lasing action appeared earlier than that of XeCl by 12 ns. The Xe partial pressure in the mixture was very critical for the double wavelength oscillation.

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on KrCl and XeCl double laser oscillation[J]. Chinese Journal of Lasers, 1985, 12(9): 521

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