[1] Y. Mori, K. Yamamura, K. Endo, K. Yamauchi, K. Yasutake, H. Goto, H. Kakiuchi, Y. Sano, and H. Mimura, J. Cryst. Growth 275, 39 (2005).
[2] Y. Verma, A. K. Chang, J. W. Berrett, K. Futtere, G. J. Gardopee, J. Kelley, T. Kyler, J. Lee, N. Lyford, and D. Proscia, Proc. SPIE 6273, 62730B (2006).
[3] Y. Mori, K. Yamauchi, K. Yamamura, and Y. Sano, Rev. Sci. Instru. 71, 4627 (2009).
[4] B. Wang, J. Zhang, and S. Dong, Chin. Opt. Lett. 7, 537 (2009).
[5] K. Yamamura, S. Shimada, and Y. Mori, CIRP Annals-Manufacturing Technol. 57, 567 (2008).
[6] C. Fanara, P. Shore, J. R. Nicholls, N. Lyford, J. Kelley, J. Carr, and P. Sommer, Adv. Eng. Mater. 8, 933 (2006).
[7] R. Xin, Plasma Emission Spectroscopy Analysis (in Chinese) (Chemical Industry Press, Beijing, 2005).
[8] The National Institute of Standards and Technology (NIST), "Handbook of Basic Atomic Spectroscopic Data", http://www.nist.gov/pml/data/handbook/index.cfm (October 18, 2010).
[9] Y. Ke and H. Dong, Analytical Chemistry Manual (III): Spectral Analysis (in Chinese) (Chemical Industry Press, Beijing, 1998).
[10] F. Placido and D. Gibson, Chin. Opt. Lett. 8, (sup.) 49 (2010).