• Chinese Journal of Lasers
  • Vol. 35, Issue s1, 81 (2008)
Zhang Xingqiang*, Cheng Yuanli, and Wang Qi
Author Affiliations
  • [in Chinese]
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    Zhang Xingqiang, Cheng Yuanli, Wang Qi. Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2008, 35(s1): 81 Copy Citation Text show less
    References

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    [3] Takaharu Mitura, Katsuhiko Murakami, Kazuaki Suzuki et al.. Nikon EUVL development progress update[C]. SPIE, 2007, 6517(7): 1~10

    [4] J. J. Rocca. Table-top soft X-ray lasers[J]. Review of Scientific Instruments, 1999, 70(10): 3799~3827

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    [2] Zhao Chengqiang, Xu Wendong, Hong Xiaogang, Li Xiaogang, Tang Xiaodong. Probe Inducing Surface Plasmon Resonance Nanolithographic System[J]. Acta Optica Sinica, 2009, 29(2): 473

    Zhang Xingqiang, Cheng Yuanli, Wang Qi. Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2008, 35(s1): 81
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