Study on Metastable Neon Beam Source Used for Atom Lithography

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 29 >Issue 1 >Page 40 > Article

Chinese Journal of Lasers
Vol. 29, Issue 1, 40 (2002)

Study on Metastable Neon Beam Source Used for Atom Lithography

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article Set citation alerts

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on Metastable Neon Beam Source Used for Atom Lithography[J]. Chinese Journal of Lasers, 2002, 29(1): 40 Copy Citation Text

show less

Abstract

A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

Keywords

atomic beam metastable state inert gas

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on Metastable Neon Beam Source Used for Atom Lithography[J]. Chinese Journal of Lasers, 2002, 29(1): 40

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information

微信扫一扫：分享

微信扫一扫：分享