Study of the Dual Oscillation of XeBr and XeCl Laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 21 >Issue 4 >Page 253 > Article

Chinese Journal of Lasers
Vol. 21, Issue 4, 253 (1994)

Study of the Dual Oscillation of XeBr and XeCl Laser

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of the Dual Oscillation of XeBr and XeCl Laser[J]. Chinese Journal of Lasers, 1994, 21(4): 253 Copy Citation Text

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Abstract

A bi-wavelength laser oscillation at 282 nm and 308 nm in a mixture of HCl/HBr/Xe/Ne is reported. The process of the dual oscillation have been analyzied. A investigation is also made about the density influence on HCl on the energy and lifetime of XeBr laseras well as HBr on XeCl laser's.

Keywords

XeBr XeCl dual oscillation

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of the Dual Oscillation of XeBr and XeCl Laser[J]. Chinese Journal of Lasers, 1994, 21(4): 253

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