At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Yutaka Nagata; Tetsuo Harada; Takeo Watanabe; Hiroo Kinoshita; Katsumi Midorikawa

doi:10.1088/2631-7990/ab3b4e

Journals >International Journal of Extreme Manufacturing >Volume 1 >Issue 3 >Page 32001 > Article

International Journal of Extreme Manufacturing
Vol. 1, Issue 3, 32001 (2019)

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Yutaka Nagata¹, Tetsuo Harada², Takeo Watanabe², Hiroo Kinoshita², and Katsumi Midorikawa^1、*

Author Affiliations

¹RIKEN Center for Advanced Photonics, RIKEN, 2-1 Hirosawa, Wako Saitama 351-0198, Japan

²Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan

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DOI: 10.1088/2631-7990/ab3b4e Cite this Article

Yutaka Nagata, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita, Katsumi Midorikawa. At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection[J]. International Journal of Extreme Manufacturing, 2019, 1(3): 32001 Copy Citation Text

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