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    Journals >Chinese Journal of Lasers >Volume 42 >Issue 1 >Page 103007 > Article
    • Chinese Journal of Lasers
    • Vol. 42, Issue 1, 103007 (2015)
    Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching
    Li Yanna1、2、*, Chen Tao1, Pan An1, Si Jinhai1, and Hou Xun1
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201542.0103007 Cite this Article Set citation alerts
    Li Yanna, Chen Tao, Pan An, Si Jinhai, Hou Xun. Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching[J]. Chinese Journal of Lasers, 2015, 42(1): 103007 Copy Citation Text show less
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    Article index updated: Jun. 3, 2024
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    Li Yanna, Chen Tao, Pan An, Si Jinhai, Hou Xun. Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching[J]. Chinese Journal of Lasers, 2015, 42(1): 103007
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