[1] Xia Y,Whitesides G M. Soft lithography. Annu Rev Mater Sci,1998,28(7):153~184
[2] Chou S Y,Krauss P R,Renstrom P J. Imprint of sub-25 nm vias and trenches in polymers. Appl Phys Lett,1995,67(6):3114~3116
[3] Chou S Y,Krauss P R. Imprint lithography with sub-l0 nm feature size and high throughput. Microelectron Eng,1997,35(1-4):237~240
[4] Liu H Z. Research on environment system and process control for step imprint lithography. Dissertation,Xi'an,Xi'an Jiaotong Univ.,2004,60~70
[5] Xu Yi. Precise determination of 633 nm He-Ne laser wavelength in air. Acta Imeko XⅡ,1991.804~808
[6] Downs M. Precision Measurement of displacement using optical interferometry. National Physical Laboratory Report,1989
[7] Miao R C,Shi J,Zhao X F. Acta Photonica Sinica,2005,34(3):382~385
[8] Xu J,Zhan S C,Cheng C. Acta Photonica Sinica,2004,33(3):263~267
[9] Zhou C L,Kang Y L. Acta Photonica Sinica,2004,33(2):171~173
[10] Mike Holmesa,Robert Hocken,David Trumpet. The long-range scanning stage: a novel platform for scanned-probe microscopy. Precision Engineering,2000,24(3):191~209
[11] Ni Y C. Measurement Technology 1998,12(32):22~27
[12] Zhang J,Feng B R,Guo Y K,et al. Acta Photonica Sinica,2003,32(4) :398~401