• Optics and Precision Engineering
  • Vol. 32, Issue 15, 2418 (2024)
Yibo ZHANG1,2, Xinxin KONG1,2,*, Sizepeng ZHAO1,2, Jingang JIA1..., Dehuai JIANG1, Jiahui SONG1 and Zhou WU1,2|Show fewer author(s)
Author Affiliations
  • 1Aerospace Information Research Institute, Chinese Academy of Sciences, Beijing00094, China
  • 2School of Optoelectronics, University of Chinese Academy of Sciences, Beijing100094, China
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    DOI: 10.37188/OPE.20243215.2418 Cite this Article
    Yibo ZHANG, Xinxin KONG, Sizepeng ZHAO, Jingang JIA, Dehuai JIANG, Jiahui SONG, Zhou WU. Vertical clamping deformation analysis and validation of 300 mm wafer warpage detection[J]. Optics and Precision Engineering, 2024, 32(15): 2418 Copy Citation Text show less
    Principle for wafer geometry measurement
    Fig. 1. Principle for wafer geometry measurement
    Wafer deformation at various tilt angles
    Fig. 2. Wafer deformation at various tilt angles
    Parametric model of wafer vertical clamping
    Fig. 3. Parametric model of wafer vertical clamping
    Sensitivity analysis of thickness direction deviation in three-point and four-point clampings
    Fig. 4. Sensitivity analysis of thickness direction deviation in three-point and four-point clampings
    Illustration of vertical wafer clamping constraints
    Fig. 5. Illustration of vertical wafer clamping constraints
    Illustration of vertical wafer clamping structure and interconnection
    Fig. 6. Illustration of vertical wafer clamping structure and interconnection
    Analysis of fixed edge support positions
    Fig. 7. Analysis of fixed edge support positions
    Correlation between fixed support location slope angle deviation and additional warpage
    Fig. 8. Correlation between fixed support location slope angle deviation and additional warpage
    Correlation between clamping force and additional warpage
    Fig. 9. Correlation between clamping force and additional warpage
    Correlation between adjustable edge support position deviation and additional warpage
    Fig. 10. Correlation between adjustable edge support position deviation and additional warpage
    Clamping reproducibility testing
    Fig. 11. Clamping reproducibility testing
    ParameterValue
    Diameter(a/mm)300
    Thickness(t/mm)0.775
    Density(ρdensity/kg·m-32 329
    Young modulus (E/GPa)162.7
    Poisson's ratio (v0.27
    Table 1. Wafer geometry and material properties
    Design parametersRequirement
    Vertical tilt angle≤0.02°
    Fixed edge support slope angle35°±1°
    Adjustable edge support clamping force magnitude≤2 N
    Adjustable edge support position0°±2°
    Table 2. Design parameter requirements for vertical wafer clamping
    Yibo ZHANG, Xinxin KONG, Sizepeng ZHAO, Jingang JIA, Dehuai JIANG, Jiahui SONG, Zhou WU. Vertical clamping deformation analysis and validation of 300 mm wafer warpage detection[J]. Optics and Precision Engineering, 2024, 32(15): 2418
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