Li Meixuan, Wang Li, Dong Lianhe. Development of a Novel Optical Variable Attenuator in Lithography Exposure System[J]. Chinese Journal of Lasers, 2018, 45(1): 103002
- Chinese Journal of Lasers
- Vol. 45, Issue 1, 103002 (2018)
Fig. 1. Schematic of lithography exposure system
Fig. 2. Structure diagram of the new optical variable attenuator. (a) Two-dimensional structure; (b) three-dimensional structure
Fig. 3. Relationship between transmittance of attenuation films and incident angle
Fig. 4. Relationship between reflectance of antireflective films and incident angle
Fig. 5. Relationship between wavelength and reflectance of antireflective films
Fig. 6. Test schematic of optical variable attenuator transmittance
Fig. 7. Transmittance of attenuator at different incident angles
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Table 1. Characteristic of common coating materials for 193 nm wavelength
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