Laser scanner for localized and rapid annealing of silicon surraces

Gao Wenqi; Ye Quanshu; Huang Xinfan

Journals >Chinese Journal of Lasers >Volume 16 >Issue 8 >Page 483 > Article

Chinese Journal of Lasers
Vol. 16, Issue 8, 483 (1989)

Laser scanner for localized and rapid annealing of silicon surraces

Gao Wenqi, Ye Quanshu, and Huang Xinfan

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article Set citation alerts

Gao Wenqi, Ye Quanshu, Huang Xinfan. Laser scanner for localized and rapid annealing of silicon surraces[J]. Chinese Journal of Lasers, 1989, 16(8): 483 Copy Citation Text

show less

References

[1] о Bryndohl, W Η Lee, Appl. Opt. 15 (1). 183 (1976)

[2] W Η Lee, "Ed by E. Wolf; Progress in Optirs VoJ. 16"(North-Holland Pub. Соmр., Amsterdam New York, Oxford, 1978), 228

Gao Wenqi, Ye Quanshu, Huang Xinfan. Laser scanner for localized and rapid annealing of silicon surraces[J]. Chinese Journal of Lasers, 1989, 16(8): 483

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information