Evolution of stress in evaporated silicon dioxide thin films

Ming Fang; Dafei Hu; Jianda Shao

doi:10.3788/COL20100801.0119

Journals >Chinese Optics Letters >Volume 8 >Issue 1 >Page 119 > Article

Chinese Optics Letters
Vol. 8, Issue 1, 119 (2010)

Evolution of stress in evaporated silicon dioxide thin films

Ming Fang^1、2, Dafei Hu^1、2, and Jianda Shao¹

Author Affiliations

¹Key Laboratory of Material Science and Technology for High Power Lasers, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Graduate School of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/COL20100801.0119 Cite this Article Set citation alerts

Ming Fang, Dafei Hu, Jianda Shao. Evolution of stress in evaporated silicon dioxide thin films[J]. Chinese Optics Letters, 2010, 8(1): 119 Copy Citation Text

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