• Chinese Journal of Lasers
  • Vol. 40, Issue 9, 908001 (2013)
Hu Zhonghua1、2、*, Zhu Jing1, Yang Baoxi1、2, Pen Xuefeng1, Zeng Aijun1、2, and Huang Huijie1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201340.0908001 Cite this Article Set citation alerts
    Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001 Copy Citation Text show less

    Abstract

    Diffractive optical element (DOE) is widely used to generate various illumination modes for pupil shaping in the lithography system. A far-field multi-parameter measuring method for the DOE is proposed according to its testing requirements of optical performance. The multi-parameters of optical performance, such as the pole balance, the pole opening angle, the pole azimuth angle, the semi-aperture angle, and the radial intensity distribution are obtained simultaneously by converting the far-field intensity distribution. The multi-parameter measurement and analysis of DOE made abroad are done experimentally. And the experimental results indicate that this measuring method can be applied to the testing of DOE for pupil shaping in the lithography system.
    Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001
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