• Chinese Journal of Lasers
  • Vol. 45, Issue 6, 0603003 (2018)
Liting Hu, Lingfei Ji*, Yan Wu, and Zhenyuan Lin
Author Affiliations
  • Institute of Laser Engineering, Beijing University of Technology, Beijing 100124, China
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    DOI: 10.3788/CJL201845.0603003 Cite this Article Set citation alerts
    Liting Hu, Lingfei Ji, Yan Wu, Zhenyuan Lin. Preparation of p-Type Heavily-Doped 4H-SiC by Laser Irradiation of Solid Al Film[J]. Chinese Journal of Lasers, 2018, 45(6): 0603003 Copy Citation Text show less
    Schematic of experimental procedure
    Fig. 1. Schematic of experimental procedure
    Curves of transmissivity and reflectivity of 4H-SiC
    Fig. 2. Curves of transmissivity and reflectivity of 4H-SiC
    EDS patterns on surface of samples before and after Al doping. (a) Undoped 4H-SiC;(b) 4H-SiC with a Al film thickness of 240 nm
    Fig. 3. EDS patterns on surface of samples before and after Al doping. (a) Undoped 4H-SiC;(b) 4H-SiC with a Al film thickness of 240 nm
    Resistance tests. (a) Schematic; (b) I-V curves between electrodes 1 and 2;(c) I-V curve between electrodes 3 and 4
    Fig. 4. Resistance tests. (a) Schematic; (b) I-V curves between electrodes 1 and 2;(c) I-V curve between electrodes 3 and 4
    Ohmic contact versus Al film thickness and number of laser pulses
    Fig. 5. Ohmic contact versus Al film thickness and number of laser pulses
    Optical micrographs and surface roughness of 4H-SiC under different numbers of laser pulses.(a) 1, micrograph; (b) 50, micrograph; (c) 1, roughness; (d) 50, roughness
    Fig. 6. Optical micrographs and surface roughness of 4H-SiC under different numbers of laser pulses.(a) 1, micrograph; (b) 50, micrograph; (c) 1, roughness; (d) 50, roughness
    Resistivity and carrier concentration versus number of laser pulses. (a) Bulk resistivity;(b) bulk carrier concentration
    Fig. 7. Resistivity and carrier concentration versus number of laser pulses. (a) Bulk resistivity;(b) bulk carrier concentration
    Hall test results of laser irradiated 4H-SiC when Al film thickness is 120 nm and number of laser pulses is 50. (a) I-V curves between electrodes 1 and 2; (b) I-V curves between electrodes 1 and 2
    Fig. 8. Hall test results of laser irradiated 4H-SiC when Al film thickness is 120 nm and number of laser pulses is 50. (a) I-V curves between electrodes 1 and 2; (b) I-V curves between electrodes 1 and 2
    XPS spectra on surface of 4H-SiC before and after Al doping
    Fig. 9. XPS spectra on surface of 4H-SiC before and after Al doping
    XPS spectra on surface of 4H-SiC before and after Al doping. (a) Si 2p orbit; (b) C 1s orbit; (c) Al 2p orbit
    Fig. 10. XPS spectra on surface of 4H-SiC before and after Al doping. (a) Si 2p orbit; (b) C 1s orbit; (c) Al 2p orbit
    Number oflaser pulsesAtomic fraction /%
    SiAlO
    010000
    182.261.3416.40
    579.412.3318.26
    1080.184.4015.42
    5078.644.916.46
    Table 1. Surface element contents of laser irradiated 4H-SiC with a Al film thickness of 240 nm
    Liting Hu, Lingfei Ji, Yan Wu, Zhenyuan Lin. Preparation of p-Type Heavily-Doped 4H-SiC by Laser Irradiation of Solid Al Film[J]. Chinese Journal of Lasers, 2018, 45(6): 0603003
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