Doping transition metal ions as a method for enhancement of ablation rate in femtosecond laser irradiation of silicate glass

Juqiang Fang; Lan Jiang; Qiang Cao; Yanping Yuan; Liangti Qu; Ji'an Duan; Yongfeng Lu

doi:10.3788/col201412.121402

Journals >Chinese Optics Letters >Volume 12 >Issue 12 >Page 121402 > Article

Chinese Optics Letters
Vol. 12, Issue 12, 121402 (2014)

Doping transition metal ions as a method for enhancement of ablation rate in femtosecond laser irradiation of silicate glass

Juqiang Fang¹, Lan Jiang¹, Qiang Cao¹, Yanping Yuan², Liangti Qu³, Ji'an Duan⁴, and Yongfeng Lu⁵

Author Affiliations

¹NanoManufacturing Fundamental Research Joint Laboratory of National Science Foundation of China, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China

²Institute of Laser Engineering, Beijing University of Technology, Beijing 100124, China

³Key Laboratory of Cluster Science, Ministry of Education, School of Chemistry, Beijing Institute of Technology, Beijing 100081, China

⁴State Key Laboratory of High Performance Complex Manufacturing, Central South University, Changsha 410083, China

⁵Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68588-0511, USA

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DOI: 10.3788/col201412.121402 Cite this Article Set citation alerts

Juqiang Fang, Lan Jiang, Qiang Cao, Yanping Yuan, Liangti Qu, Ji'an Duan, Yongfeng Lu. Doping transition metal ions as a method for enhancement of ablation rate in femtosecond laser irradiation of silicate glass[J]. Chinese Optics Letters, 2014, 12(12): 121402 Copy Citation Text

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