• Chinese Journal of Lasers
  • Vol. 37, Issue 7, 1892 (2010)
Xu Guangshen*, Ma Xunming, Luo Sheng, Qiu Ronghua, Hu Songqiao, and Pan Huan
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  • [in Chinese]
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    DOI: 10.3788/cjl20103707.1892 Cite this Article Set citation alerts
    Xu Guangshen, Ma Xunming, Luo Sheng, Qiu Ronghua, Hu Songqiao, Pan Huan. Novel Stereolithography System Employing Digital Micro-Mirror Device[J]. Chinese Journal of Lasers, 2010, 37(7): 1892 Copy Citation Text show less

    Abstract

    To fabricate small objects with high accuracy and low cost,an integral stereolithography (SL) system has been developed,and the system consists of dynamic pattern generator,recoating system and control system. Photo-sensitive resin is solidified with image mask produced by dynamic pattern generator,and then small objects can be fabricated. Ultraviolet (UV) light intensity distribution in the imaging plane is investigated,and the relationship of UV light intensity with position in the imaging plane and gray-scale of pattern is established with least squares method. Uniformity UV light intensity distribution is obtained by controlling the gray-scale value at different positions in the imaging plane according to the relationship,and the difference between maximum and minimum value of UV light intensity is 0.4 μW/cm2. Small objects with microstructures are built with the SL system. A test part was designed,and the results of accuracy testing and statistical analysis demonstrate that the dimensions with error within ±0.06 mm are 72.22% in all testing dimensions. The notable characteristic of the novel SL system is that the new SL system can fabricate micro-structures with high-resolution at low cost.
    Xu Guangshen, Ma Xunming, Luo Sheng, Qiu Ronghua, Hu Songqiao, Pan Huan. Novel Stereolithography System Employing Digital Micro-Mirror Device[J]. Chinese Journal of Lasers, 2010, 37(7): 1892
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