Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region

LI Qi; QI Yuejing; LU Zengxiong; ZHANG Qingyang; MA Jing; YANG Guanghua; SU Jiani

doi:10.16818/j.issn1001-5868.2020.03.018

Journals >Semiconductor Optoelectronics >Volume 41 >Issue 3 >Page 395 > Article

Semiconductor Optoelectronics
Vol. 41, Issue 3, 395 (2020)

Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region

LI Qi^1,2, QI Yuejing^1,2,*, LU Zengxiong^1,2, ZHANG Qingyang¹..., MA Jing¹, YANG Guanghua^1,2 and SU Jiani¹|Show fewer author(s)

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¹[in Chinese]

²[in Chinese]

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DOI: 10.16818/j.issn1001-5868.2020.03.018 Cite this Article

LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395 Copy Citation Text

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References

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[5] European Machine Vision Association. Standard for characterization of image sensors and cameras[S]. Germany: EMVA Standard 1288, 2010.

[13] Dickey F M, Lizotte T E. Laser Beam Shaping Applications[M]. 2nd Edi., UK: CRC Press, 2016.

[14] Focus Software Zemax. Optical Design Program User’s Guide[M]. USA: Focus Software Incorporated, 2001: 257.