• Chinese Journal of Lasers
  • Vol. 31, Issue 7, 785 (2004)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Novel Homogenizer to Improve the Excimer Laser Beam Uniformity[J]. Chinese Journal of Lasers, 2004, 31(7): 785 Copy Citation Text show less
    References

    [1] Doh Hoon Kim, Byung-Ho Nam, Kag Hyeon Lee et al.. Probe beam scan type auto-focus system using position sensing detector for sub-half micron lithography tools [C]. SPIE, 1996, 2726:876~886

    [2] Doh Hoon Kim, Kag Hyeon Lee, Jong Soo Kim et al.. Performance of small field 193 nm exposure system [C]. SPIE, 1997, 3051:922~932

    [6] M. R. Latta, K. Jain. Beam intensity uniformization by mirror folding[J]. Opt. Commun., 1984, 49(6):435~439

    [7] G. Klauminzer, C. Abele. Excimer lasers need specifications for beam uniformity[J]. Laser Focus World, 1991, 27(5):153~158

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Novel Homogenizer to Improve the Excimer Laser Beam Uniformity[J]. Chinese Journal of Lasers, 2004, 31(7): 785
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