Xue Chunrong, Yi Kui, Shao Jianda, Fan Zhengxiu. 193 nm Fluoride High Reflection Mirror[J]. Chinese Journal of Lasers, 2010, 37(8): 2068
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In order to develop low loss,high-performance 193 nm fluoride high reflection (HR) mirrors,the properties of 193 nm HR mirrors are researched in depth in this paper. The thickness of 193 nm reflective film is controlled by a 1/3 baffle with pre-coating technology. Different fluoride HR mirrors are deposited by a molybdenum boat evaporation process on fused silica substrates. Their optical properties (including reflectance,transmittance,and optical loss),microstructures (including cross section morphology and surface roughness) and mechanical properties (stress) are investigated and compared. Based on these studies,the NdF3/AlF3 193 nm HR mirror is designed and made. Under the present experimental conditions,its reflectance is up to 96%.