The recent development of soft x-ray interference lithography in SSRF

Jun Zhao; Shumin Yang; Chaofan Xue; Liansheng Wang; Zhaofeng Liang; Lei Zhang; Yong Wang; Yanqing Wu; Renzhong Tai

doi:10.1088/2631-7990/ab70ae

Journals >International Journal of Extreme Manufacturing >Volume 2 >Issue 1 >Page 12005 > Article

International Journal of Extreme Manufacturing
Vol. 2, Issue 1, 12005 (2020)

The recent development of soft x-ray interference lithography in SSRF

Jun Zhao^1、2, Shumin Yang^1、2, Chaofan Xue^1、2, Liansheng Wang^1、2, Zhaofeng Liang¹, Lei Zhang², Yong Wang^1、2, Yanqing Wu^1、2、*, and Renzhong Tai^1、2

Author Affiliations

¹Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China

²Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China

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DOI: 10.1088/2631-7990/ab70ae Cite this Article

Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 12005 Copy Citation Text

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