For aberration compensation requirement of projection objective lens in deep ultraviolet lithography, the stress analysis of the lens in eccentric adjusting is carried out. A kind of lens supporting with multi-flexure is designed based on compliance matrix method. Regularity between the adjusting force and the surface figure of the lens is investigated. Relationship among the adjusting force, the peak valley (PV) value, the root mean square (RMS) value and Fringe Zernike coefficients of the lens are analyzed using the finite element method. The results show that the aberration can be restricted by reducing the adjusting force. By using flexible support mechanism for absorbing adjusting force, the PV value and RMS value of the upper surface of the lens are 2.704 nm and 0.528 nm, the lower surface are 2.984 nm and 0.571 nm respectively in full stroke eccentric adjusting. The PV value, the RMS value and Fringe Zernike coefficients of the lens vary linearly with the adjusting force. The adjusting force does not change the nature of the aberration. The aberration is mainly astigmatism.