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Journals >Chinese Journal of Lasers >Volume 23 >Issue 9 >Page 801 > Article

Chinese Journal of Lasers
Vol. 23, Issue 9, 801 (1996)

The Roughness of the Very Thin Si Films

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Roughness of the Very Thin Si Films[J]. Chinese Journal of Lasers, 1996, 23(9): 801 Copy Citation Text

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Abstract

The surface roughness of the very thin Si films deposited on the K9 glass and thesilicon wafer using planar magnetron sputtering has ben measured by ZYGO and scatteringmethods. A saturated value of the roughness of the very thin Si films on the K9 glass isillustrated.

Keywords

thin Si film ZYGO surface RMS roughness

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Roughness of the Very Thin Si Films[J]. Chinese Journal of Lasers, 1996, 23(9): 801

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