A 10 J level of optically pumping XeF(C-A) laser has been developed which can be operated on repetition mode. The laser system consists of a laser device and a XeF2 generator. The laser chamber is 167 cm in length, 20 cm in height and 13 cm in width with an aperture of 5 cm×5 cm. The irradiation from a sectioned surface discharge is used to photolysis XeF2. Lasing is investigated by employing a stable resonator with the length of 210 cm and the output coupling of 10%. The active mixed gases with XeF2 concentration of (0.6～1.2)×1017 cm-3 can be obtained from XeF2 generator. The lasing experiments have been performed and the laser can be operated in the repetitive rate of 0.2～1 Hz. At present, the maximum output energy of first pulse is 18.7 J and the total conversion efficiency of 2.5‰ is obtained. The duration of laser pulse is about 1 μs.