Researching | Emulation of synchrotron radiation high-resolution actinic review for EUV mask

Journals >NUCLEAR TECHNIQUES >Volume 48 >Issue 3 >Page 030102 > Article

NUCLEAR TECHNIQUES
Vol. 48, Issue 3, 030102 (2025)

Emulation of synchrotron radiation high-resolution actinic review for EUV mask

Zijing SU^1,3, Haigang LIU^1,2, Xiangyu MENG^1,2, Xiangzhi ZHANG^1,2..., Bo ZHAO¹, Zhi GUO^1,2, Yong WANG^1,2,** and Renzhong TAI^1,2,3,*|Show fewer author(s)

Author Affiliations

¹Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China

²Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China

³ShanghaiTech University, Shanghai 201210, China

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DOI: 10.11889/j.0253-3219.2025.hjs.48.240151 Cite this Article

Zijing SU, Haigang LIU, Xiangyu MENG, Xiangzhi ZHANG, Bo ZHAO, Zhi GUO, Yong WANG, Renzhong TAI. Emulation of synchrotron radiation high-resolution actinic review for EUV mask[J]. NUCLEAR TECHNIQUES, 2025, 48(3): 030102 Copy Citation Text

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References

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[12] Lee S, Guizar-Sicairos M, Ekinci Y et al. A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source[J]. Proceedings of SPIE, 9048, 904811(2014).

[13] Bakshi V[M]. EUV Lithography, 325-381(2009).

[14] Liu P, Xie X B, Liu W et al. Fast 3D thick mask model for full-chip EUVL simulations[J]. Proceedings of SPIE, 8679, 86790W(2013).

[15] Migura S, Kneer B, Neumann J T et al. Anamorphic high-NA EUV lithography optics[J]. Proceedings of SPIE, 9661, 96610T(2015).

[16] Benk M P, Wojdyla A, Chao W L et al. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 15, 033501(2016).

[17] GUO Chunlei, MENG Xiangyu, WU Yanqing et al. Investigation on the coherence of undulator source and soft X-ray interference lithography beamline in SSRF[J]. Nuclear Techniques, 36, 090101(2013).

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Zijing SU, Haigang LIU, Xiangyu MENG, Xiangzhi ZHANG, Bo ZHAO, Zhi GUO, Yong WANG, Renzhong TAI. Emulation of synchrotron radiation high-resolution actinic review for EUV mask[J]. NUCLEAR TECHNIQUES, 2025, 48(3): 030102

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