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    Journals >Optical Instruments >Volume 33 >Issue 1 >Page 78 > Article
    • Optical Instruments
    • Vol. 33, Issue 1, 78 (2011)
    Influence of target erosion on film distribution in magnetron sputtering process
    ZHANG Yongxi, JIN Xiu, HU Wenwen, SONG Shu..., ZHANG Lingling and ZHANG Yue|Show fewer author(s)
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    DOI: 10.3969/j.issn.1005-5630.2011.01.018 Cite this Article
    ZHANG Yongxi, JIN Xiu, HU Wenwen, SONG Shu, ZHANG Lingling, ZHANG Yue. Influence of target erosion on film distribution in magnetron sputtering process[J]. Optical Instruments, 2011, 33(1): 78 Copy Citation Text show less
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    ZHANG Yongxi, JIN Xiu, HU Wenwen, SONG Shu, ZHANG Lingling, ZHANG Yue. Influence of target erosion on film distribution in magnetron sputtering process[J]. Optical Instruments, 2011, 33(1): 78
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