Youliang WANG, Xichun GAO, Wenjuan ZHANG, Jiang GUO. Influence of water in magnetic compound fluid on polishing performance[J]. Optics and Precision Engineering, 2023, 31(24): 3559
- Optics and Precision Engineering
- Vol. 31, Issue 24, 3559 (2023)
Fig. 1. Schematic diagram of MCF polishing device
Fig. 2. Polishing device of MCF polishing process
Fig. 3. Images of polished surface and measured infrared temperature
Fig. 4. Surface roughness， decline rate and material removal change with time
Fig. 5. MCF morphologies of different water content before and after polishing
Fig. 6. Variation of polishing temperature with time for different components of MCF
Fig. 7. Normal force of MCF with different water content over time
Fig. 8. Formation mechanism of clustered structures with different water content
Fig. 9. Changes of surface roughness， decline rate and material removal with polishing time
Fig. 10. Morphologies of MCF2 at different polishing time with supplying water
Fig. 11. Polishing temperature variation of MCF over time with supplementary water
Fig. 12. Normal force variation of MCF over time with supplementary water
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Table 1. Experimental parameters
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Table 2. MCF component
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