• Chinese Journal of Lasers
  • Vol. 29, Issue s1, 418 (2002)
KONG Ling-bin1、2, YI Xin-jian1, WANG Dian-hong2, CHEN Si-hai1, and HUANG Guang3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    KONG Ling-bin, YI Xin-jian, WANG Dian-hong, CHEN Si-hai, HUANG Guang. Research on the Photoresist Action in Fabrication of Binary Optical Elements[J]. Chinese Journal of Lasers, 2002, 29(s1): 418 Copy Citation Text show less

    Abstract

    The photoresist is very important in fabrication of Binary Optical Elements (BOE). In this paper, different photoresist are used and compared in the photolithography and etching process of fabricating BOE. By adjusting the type of photoresist according to various patterns, BOE with good performance have been accomplished.
    KONG Ling-bin, YI Xin-jian, WANG Dian-hong, CHEN Si-hai, HUANG Guang. Research on the Photoresist Action in Fabrication of Binary Optical Elements[J]. Chinese Journal of Lasers, 2002, 29(s1): 418
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