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    Journals >Acta Photonica Sinica >Volume 36 >Issue 3 >Page 462 > Article
    • Acta Photonica Sinica
    • Vol. 36, Issue 3, 462 (2007)
    Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography
    [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J]. Acta Photonica Sinica, 2007, 36(3): 462 Copy Citation Text show less
    References

    [1] LARS Erdmann,ARNAUD Deparnay,FALK Wirth,et al.MEMS based lithography for the fabrication of microoptical components[C].SPIE,2004,5347:79-84.

    [3] JUTAMULIA S,SHINJI Toyoda,YUICHI Ichihashi.Removal of pixel structure in liquid crystal projection display[C].SPIE,1995,2047:168-176.

    [4] EUGENE Dolgoff.New optical designs for large screen,2-and 3 dimension video projection with enhanced screen brightness and no visible pixel or line structure[C].SPIE,1995,2047:104-118.

    [8] HORNBECK L J.Digital light processingTM for high-brightness,high-resolution applications[C].SPIE,1997,3013:27-40.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J]. Acta Photonica Sinica, 2007, 36(3): 462
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