• Optical Instruments
  • Vol. 35, Issue 1, 48 (2013)
LI Li1, LI Gang1, QI Xiaohui2, LIU Bingqi1, and XU Chunmei1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3969/j.issn.1005-5630.2013.01.010 Cite this Article
    LI Li, LI Gang, QI Xiaohui, LIU Bingqi, XU Chunmei. Simulation of aberration′s shearing interference pattern[J]. Optical Instruments, 2013, 35(1): 48 Copy Citation Text show less

    Abstract

    To judge the aberration of optical system, a simulation of the shearing interference pattern of the aberration′s was presented. The relationship of aberration and interferogram was constituted, which is based on the aberration theory and shearing interferometry. Interference patterns of primary aberrations and secondary aberrations were simulated. The simulaton results showed that any primary or secondary aberration has its characteristic interference pattern, which can be used to judge the aberration. These results can provide evidence for judging which kinds of optical aberrations the optical systems have.