Xiao-Yun Zhao, Bing-Kai Zhang, Chun-Xiao Wang, Yi-Jia Tang. Effects of q-nonextensive distribution of electrons on secondary electron emission in plasma sheath [J]. Acta Physica Sinica, 2019, 68(18): 185204-1
- Acta Physica Sinica
- Vol. 68, Issue 18, 185204-1 (2019)
Fig. 1. Schematic diagram of plasma sheath等离子体鞘层示意图
Fig. 2. Critical Mach number versus nonextensive parameter q for different values of secondary electron emission coefficients (
,
and
).
二次电子发射系数不同时临界马赫数随q 的变化(
,
和
)
Fig. 3. Wall potential versus nonextensive parameter q for different values of secondary electron emission coefficients (
,
and
): (a) q = 0.5−1.0; (b)q = 1.0−2.0.
二次电子发射系数不同时器壁电势随参量q 的变化 (a) q = 0.5—1.0; (b) q = 1.0—2.0
Fig. 4. Critical emission coefficient of secondary electrons versus nonextensive parameter q for different kinds of plasma.
器壁二次电子临界发射系数
随q 的变化
Fig. 5. Normalized density of secondary electrons in plasma sheath versus x for different values of nonextensive parameter q (
).
参量q 对鞘层中二次电子数密度的影响(
)
Fig. 6. Normalized density of secondary electrons at the sheath edge versus nonextensive parameter q for different values of secondary electron emission coefficients (
,
and
).
参量q 对不同发射系数下到达鞘边二次电子数密度的影响
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