Study on Developing Process of Large‑size Mask

Huachao ZHANG; Xiang GE; Qilong XIONG

doi:10.19453/j.cnki.1005-488x.2022.02.009

Journals >Optoelectronic Technology >Volume 42 >Issue 2 >Page 129 > Article

Optoelectronic Technology
Vol. 42, Issue 2, 129 (2022)

Study on Developing Process of Large‑size Mask

Huachao ZHANG, Xiang GE, and Qilong XIONG

Author Affiliations

Hefei Qingyi Photomask Limited Company，Hefei 230011，CHN

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DOI: 10.19453/j.cnki.1005-488x.2022.02.009 Cite this Article

Huachao ZHANG, Xiang GE, Qilong XIONG. Study on Developing Process of Large‑size Mask[J]. Optoelectronic Technology, 2022, 42(2): 129 Copy Citation Text

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Abstract

The Spray development spray mode and Slit development spray mode in the production process of large-size mask were compared and analyzed. Through experiments and production process monitoring， the advantages and disadvantages of the two development spray modes were obtained. Through comprehensive comparison， it was concluded that Slit development spray mode was better in the production process of mask plate.

Keywords

developing nozzle developing process large-size mask slit liquid curtain uniformity

Huachao ZHANG, Xiang GE, Qilong XIONG. Study on Developing Process of Large‑size Mask[J]. Optoelectronic Technology, 2022, 42(2): 129

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