• Semiconductor Optoelectronics
  • Vol. 42, Issue 5, 747 (2021)
LIU Xuan1、2, JIA Xin1, and FU Taotao1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2021060302 Cite this Article
    LIU Xuan, JIA Xin, FU Taotao. Influence of Support Deformation on Sub-Nano Level Surface Shape Detection Accuracy[J]. Semiconductor Optoelectronics, 2021, 42(5): 747 Copy Citation Text show less

    Abstract

    The surface shape accuracy of the transparent objective lens in the lithographic projection objective is one of the key factors affecting the imaging quality of the optical system, and the support deformation is a very important factor affecting the surface shape accuracy. In order to improve the reproducibility of the optical inspection of the large-aperture lens, an integral flexible support structure was designed, and the influence of the number of shrapnel and various dimensional parameters on the surface accuracy and reproducibility of the lens under the action of gravity was analyzed. The analysis results show that: increasing the number of shrapnel, reducing the distance between the support and the center of the lens and increasing the thickness of the shrapnel can reduce the deformation of the lens. The reproduction accuracy can be improved by shortening the length of the shrapnel, increasing the thickness of the shrapnel and the number of shrapnel. According to the analysis of the relationship between the influence factors and the reproducibility, the reproducibility under the optimized parameters is 0.21nm rms, which can meet the high-precision surface shape requirements of the lens in the deep ultraviolet lithography projection objective.
    LIU Xuan, JIA Xin, FU Taotao. Influence of Support Deformation on Sub-Nano Level Surface Shape Detection Accuracy[J]. Semiconductor Optoelectronics, 2021, 42(5): 747
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