• Infrared and Laser Engineering
  • Vol. 51, Issue 11, 20220136 (2022)
Hu Wang1、2 and Yu He1、*
Author Affiliations
  • 1Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/IRLA20220136 Cite this Article
    Hu Wang, Yu He. Optical lithography on tilted and curved surfaces based on computer generated holography[J]. Infrared and Laser Engineering, 2022, 51(11): 20220136 Copy Citation Text show less

    Abstract

    Micro-structural elements on tilted and curved surfaces has important applications in microelectronics, micro-optics, micro-fluidics and other fields. In order to achieve rapid and low-cost lithography of tilted and curved surfaces, the method is proposed, in which pure phase computer generated holography technology based on liquid crystal spatial light modulator is used to project target pattern to the tilted and curved surfaces completing exposure. The tilted and curved surfaces pure phase computer generated holographic light fields are generated, and the speckle elimination and stray light removal of the optical field are processed. The experimental verification of tilted and curved surfaces lithography is completed. The experimental results show that the method has high machining efficiency, flexible design and is not limited by a single structure. It is a potential 3D micro-nano machining method.
    Hu Wang, Yu He. Optical lithography on tilted and curved surfaces based on computer generated holography[J]. Infrared and Laser Engineering, 2022, 51(11): 20220136
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